Proceedings of Technical Program of 2012 VLSI Technology, System and Application

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Proceedings of Technical Program of 2012 VLSI Technology, System and Application - 最新文献

Stabilization of resistive switching with controllable self-compliant Ta2O5-based RRAM

Pub Date : 2012-04-23 DOI: 10.1109/VLSI-TSA.2012.6210099 W. Chen, T. Y. Wu, S. Y. Yang, W. H. Liu, H. Y. Lee, Y. S. Chen, C. Tsai, P. Gu, K. Tsai, H. Wei, P. S. Chen, Y. H. Wang, F. Chen, M. Tsai

PMOSFET layout dependency with embedded SiGe Source/Drain at POLY and STI edge in 32/28nm CMOS technology

Pub Date : 2012-04-23 DOI: 10.1109/VLSI-TSA.2012.6210152 L. Song, Y. Liang, H. Onoda, C. W. Lai, T. Wallner, A. Pofelski, C. Gruensfelder, E. Josse, T. Okawa, J. Brown, R. Williams, J. Holt, J. W. Weijtmans, B. Greene, H. Utomo, S. Lee, D. Nair, Q. Zhang, C. Zhu, X. Wu, M. Sherony, Y. Lee, W. Henson, R. Divakaruni, E. Kaste

Transforming memory systems: Optimizing for client value on emerging workloads

Pub Date : 2012-04-23 DOI: 10.1109/VLSI-DAT.2012.6212609 K. Nowka

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