Journal of Micro/Nanopatterning, Materials, and Metrology

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Journal of Micro/Nanopatterning, Materials, and Metrology - 最新文献

Stabilizing high aspect ratio x-ray gratings with top layer resist grid

Pub Date : 2024-02-14 DOI: 10.1117/1.jmm.23.1.014901 Michael Richter, Thomas Beckenbach, Constantin Rauch, Stephan Schreiner, Marcus Zuber, Elias Hamann, Arndt Last, Martin Börner, Jan Korvink, Pascal Meyer

Curvilinear mask process correction embedded on multi-beam mask writer

Pub Date : 2024-02-14 DOI: 10.1117/1.jmm.23.1.011206 N. Nakayamada, H. Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, N. Shirali, Yukihiro Masuda, Aki Fujimura

Curvilinear mask process correction embedded on multi-beam mask writer

Pub Date : 2024-02-14 DOI: 10.1117/1.jmm.23.1.011206 N. Nakayamada, H. Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, N. Shirali, Yukihiro Masuda, Aki Fujimura

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