Michael Richter, Thomas Beckenbach, Constantin Rauch, Stephan Schreiner, Marcus Zuber, Elias Hamann, Arndt Last, Martin Börner, Jan Korvink, Pascal Meyer
{"title":"Stabilizing high aspect ratio x-ray gratings with top layer resist grid","authors":"Michael Richter, Thomas Beckenbach, Constantin Rauch, Stephan Schreiner, Marcus Zuber, Elias Hamann, Arndt Last, Martin Börner, Jan Korvink, Pascal Meyer","doi":"10.1117/1.jmm.23.1.014901","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":197650,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"373 3","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanopatterning, Materials, and Metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.jmm.23.1.014901","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}