N. Nakayamada, H. Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, N. Shirali, Yukihiro Masuda, Aki Fujimura
{"title":"Curvilinear mask process correction embedded on multi-beam mask writer","authors":"N. Nakayamada, H. Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, N. Shirali, Yukihiro Masuda, Aki Fujimura","doi":"10.1117/1.jmm.23.1.011206","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":197650,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"51 17","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanopatterning, Materials, and Metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.jmm.23.1.011206","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
