半导体中放射性溶质与点缺陷的配对

Thomas Wichert
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引用次数: 0

摘要

利用放射性溶质作为局部观察者,在原子尺度上对晶体中溶质点缺陷相互作用进行了研究。因此,通过改变溶质周围的电荷分布,可以观察到溶质原子附近的点缺陷的存在,从而产生缺陷特异性电场梯度。利用微扰γγ角相关技术,通过发生在放射性原子核位置的超精细相互作用来检测这种电场梯度。对溶质点缺陷对的灵敏度一般在1016cm-3量级。讨论了它们的化学性质和热力学性质。本文讨论的点缺陷有内在缺陷,如晶格空位,也有外在缺陷,如取代和间隙杂质原子。将讨论元素半导体Si和不同的II-VI化合物半导体的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pairing between Radioactive Solutes and Point-Defects in Semiconductors

The study of solute point-defect interactions in crystals is performed on an atomic scale by employing radioactive solutes as local observers. Thereby, the presence of a point-defect next to the solute atom becomes observable via the altered electronic charge distribution about the solute, giving rise to a defect-specific electric field gradient. Using the perturbed γγ angular correlation technique, this electric field gradient is detected via the hyperfine interaction occurring at the site of the nucleus of the radioactive atom. The sensitivity to solute point-defect pairs is typically in the order of 1016cm–3. Several properties of these pairs, such as their chemical nature and thermodynamical behaviour are discussed. The point-defects addressed in this paper are intrinsic, such as lattice vacancies, and extrinsic, such as substitutional and interstitial impurity atoms. Results for the elemental semiconductor Si and different II-VI compound semiconductors will be discussed.

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