Hans T. Nembach;Justin M. Shaw;Chloe S. Taylor;Daniel B. Gopman
{"title":"Pt溅射过程中气体成分对CoFeB薄膜结构和磁性能的影响","authors":"Hans T. Nembach;Justin M. Shaw;Chloe S. Taylor;Daniel B. Gopman","doi":"10.1109/LMAG.2022.3225742","DOIUrl":null,"url":null,"abstract":"Ultrathin Ta/CoFeB/Pt trilayer structures are relevant to a wide range of spintronic applications, from magnetic tunnel junctions to skyrmionics devices. Controlling the perpendicular magnetic anisotropy, Gilbert damping, and Dzyaloshinskii–Moriya interaction (DMI) in the CoFeB layer is key for these applications. We examine the role of sputter gas composition during the Pt overlayer deposition of a Ta/CoFeB/Pt trilayer in Ar, Kr, and Xe working gas environments during direct current magnetron sputtering. The decreasing density of the Pt layer (from 21 to 15 g/cm\n<sup>3</sup>\n) was apparent in specular X-ray reflectivity measurements of the trilayer films when increasing the molecular weight of the sputtering gas from Ar to Kr to Xe. Significant effects on the Gilbert damping and the interfacial DMI energy were observed, with increases in the damping from 0.037(1) to 0.042(1) to 0.048(1), and reductions in the interfacial DMI from 0.47(4) mJ/m\n<sup>2</sup>\n to 0.45(5) mJ/m\n<sup>2</sup>\n to 0.39(4) mJ/m\n<sup>2</sup>\n. The ability to control the perpendicular magnetization and DMI strength of these materials through judicious interfacial control is a means toward magnetic devices with better stability at smaller lateral dimensions, the key to device scaling for spintronic device arrays.","PeriodicalId":13040,"journal":{"name":"IEEE Magnetics Letters","volume":"13 ","pages":"1-4"},"PeriodicalIF":1.1000,"publicationDate":"2022-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10161395/pdf/nihms-1880596.pdf","citationCount":"0","resultStr":"{\"title\":\"Effect of Gas Composition During Pt Sputtering on Structural and Magnetic Properties of CoFeB Thin Films\",\"authors\":\"Hans T. Nembach;Justin M. Shaw;Chloe S. Taylor;Daniel B. Gopman\",\"doi\":\"10.1109/LMAG.2022.3225742\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ultrathin Ta/CoFeB/Pt trilayer structures are relevant to a wide range of spintronic applications, from magnetic tunnel junctions to skyrmionics devices. Controlling the perpendicular magnetic anisotropy, Gilbert damping, and Dzyaloshinskii–Moriya interaction (DMI) in the CoFeB layer is key for these applications. We examine the role of sputter gas composition during the Pt overlayer deposition of a Ta/CoFeB/Pt trilayer in Ar, Kr, and Xe working gas environments during direct current magnetron sputtering. The decreasing density of the Pt layer (from 21 to 15 g/cm\\n<sup>3</sup>\\n) was apparent in specular X-ray reflectivity measurements of the trilayer films when increasing the molecular weight of the sputtering gas from Ar to Kr to Xe. Significant effects on the Gilbert damping and the interfacial DMI energy were observed, with increases in the damping from 0.037(1) to 0.042(1) to 0.048(1), and reductions in the interfacial DMI from 0.47(4) mJ/m\\n<sup>2</sup>\\n to 0.45(5) mJ/m\\n<sup>2</sup>\\n to 0.39(4) mJ/m\\n<sup>2</sup>\\n. The ability to control the perpendicular magnetization and DMI strength of these materials through judicious interfacial control is a means toward magnetic devices with better stability at smaller lateral dimensions, the key to device scaling for spintronic device arrays.\",\"PeriodicalId\":13040,\"journal\":{\"name\":\"IEEE Magnetics Letters\",\"volume\":\"13 \",\"pages\":\"1-4\"},\"PeriodicalIF\":1.1000,\"publicationDate\":\"2022-12-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10161395/pdf/nihms-1880596.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Magnetics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/9983810/\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Magnetics Letters","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/9983810/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Effect of Gas Composition During Pt Sputtering on Structural and Magnetic Properties of CoFeB Thin Films
Ultrathin Ta/CoFeB/Pt trilayer structures are relevant to a wide range of spintronic applications, from magnetic tunnel junctions to skyrmionics devices. Controlling the perpendicular magnetic anisotropy, Gilbert damping, and Dzyaloshinskii–Moriya interaction (DMI) in the CoFeB layer is key for these applications. We examine the role of sputter gas composition during the Pt overlayer deposition of a Ta/CoFeB/Pt trilayer in Ar, Kr, and Xe working gas environments during direct current magnetron sputtering. The decreasing density of the Pt layer (from 21 to 15 g/cm
3
) was apparent in specular X-ray reflectivity measurements of the trilayer films when increasing the molecular weight of the sputtering gas from Ar to Kr to Xe. Significant effects on the Gilbert damping and the interfacial DMI energy were observed, with increases in the damping from 0.037(1) to 0.042(1) to 0.048(1), and reductions in the interfacial DMI from 0.47(4) mJ/m
2
to 0.45(5) mJ/m
2
to 0.39(4) mJ/m
2
. The ability to control the perpendicular magnetization and DMI strength of these materials through judicious interfacial control is a means toward magnetic devices with better stability at smaller lateral dimensions, the key to device scaling for spintronic device arrays.
期刊介绍:
IEEE Magnetics Letters is a peer-reviewed, archival journal covering the physics and engineering of magnetism, magnetic materials, applied magnetics, design and application of magnetic devices, bio-magnetics, magneto-electronics, and spin electronics. IEEE Magnetics Letters publishes short, scholarly articles of substantial current interest.
IEEE Magnetics Letters is a hybrid Open Access (OA) journal. For a fee, authors have the option making their articles freely available to all, including non-subscribers. OA articles are identified as Open Access.