浮栅场效应管(FGFET)电路仿真的逻辑应用

Yunjae Kim , Hyoungsoo Kim , Jongwook Jeon , Seungjae Baik , Myounggon Kang
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引用次数: 0

摘要

本文提出了一种浮栅场效应晶体管(FGFET)结构,并进行了仿真验证。当前的存储设备通常依赖于冯·诺依曼架构,而这种架构存在冯·诺依曼瓶颈。所提出的FGFET不容易受到冯诺依曼瓶颈,因为存储单元和处理单元不单独工作。FGFET由传感器场效应管(Sensor FET)和垂直场效应管(Vertical FET)组成,可以形成一个存储节点,并将各部分连接起来。此外,FGFET的优点是可以使用传统的CMOS工艺。在这方面,使用现有CMOS工艺开发的FGFET表明,与传统逻辑电路相比,电路尺寸,功耗和操作延迟显着降低。此外,还进行了各种电路仿真,包括所提出的FGFET,如逆变器和NAND/NOR门,突出了所提出的FGFET的优点。本研究为使用基于cmos的存储逻辑集成器件和架构来缓解冯诺依曼瓶颈奠定了基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Circuit simulation of floating-gate FET (FGFET) for logic application

In this study, a floating-gate field-effect transistor (FGFET) structure is proposed and verified through simulations. Current memory devices often rely on the von Neumann architecture which suffers from von Neumann bottleneck. The proposed FGFET is not vulnerable to the von Neumann bottleneck because the memory cell and process unit do not function separately. FGFET is composed with Sensor FET(SFET) and Vertical FET(VFET), which can form a memory node with connection of each part. Moreover, the advantage of FGFET is that the conventional CMOS process can be used. In this regard, the developed FGFET using the existing CMOS process shows that the circuit size, power consumption, and operation delay are significantly reduced compared to a conventional logic circuit. Furthermore, various circuit simulations comprising the proposed FGFET, such as an inverter and NAND/NOR gate, are performed, highlighting the advantages of the proposed FGFET. This study lays the foundation for using a CMOS-based memory logic integrated device and architecture for alleviating the von Neumann bottleneck.

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