后门功函数对提高AJDMDG堆叠MOSFET模拟/射频性能的影响

Arighna Basak , Angsuman Sarkar
{"title":"后门功函数对提高AJDMDG堆叠MOSFET模拟/射频性能的影响","authors":"Arighna Basak ,&nbsp;Angsuman Sarkar","doi":"10.1016/j.ssel.2020.12.005","DOIUrl":null,"url":null,"abstract":"<div><p>In this work, the impact of back gate work function on analog/RF performance of Asymmetric Junctionless Dual Material Double Gate MOSFET with high K gate Stack (AJDMDG Stack MOSFET) has been studied. The impact of back gate work function on analog/RF parameters like drain current (I<sub>D</sub>), transconductance (g<sub>m</sub>), transconductance generation factor (TGF), intrinsic gain, output resistance (r<sub>out</sub>), cut-off frequency, maximum frequency of oscillation (f<sub>max</sub>) etc. have been studied through TCAD device simulator. The results reveal that an improvement in analog/RF performance has been achieved by choosing a low value work function of the back gate.</p></div>","PeriodicalId":101175,"journal":{"name":"Solid State Electronics Letters","volume":"2 ","pages":"Pages 117-123"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/j.ssel.2020.12.005","citationCount":"5","resultStr":"{\"title\":\"Impact of back gate work function for enhancement of analog/RF performance of AJDMDG Stack MOSFET\",\"authors\":\"Arighna Basak ,&nbsp;Angsuman Sarkar\",\"doi\":\"10.1016/j.ssel.2020.12.005\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>In this work, the impact of back gate work function on analog/RF performance of Asymmetric Junctionless Dual Material Double Gate MOSFET with high K gate Stack (AJDMDG Stack MOSFET) has been studied. The impact of back gate work function on analog/RF parameters like drain current (I<sub>D</sub>), transconductance (g<sub>m</sub>), transconductance generation factor (TGF), intrinsic gain, output resistance (r<sub>out</sub>), cut-off frequency, maximum frequency of oscillation (f<sub>max</sub>) etc. have been studied through TCAD device simulator. The results reveal that an improvement in analog/RF performance has been achieved by choosing a low value work function of the back gate.</p></div>\",\"PeriodicalId\":101175,\"journal\":{\"name\":\"Solid State Electronics Letters\",\"volume\":\"2 \",\"pages\":\"Pages 117-123\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/j.ssel.2020.12.005\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid State Electronics Letters\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2589208821000016\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid State Electronics Letters","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2589208821000016","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

本文研究了后门功函数对非对称无结高K栅极堆叠双材料双栅MOSFET (AJDMDG堆叠MOSFET)模拟/射频性能的影响。通过TCAD器件模拟器研究了后门功函数对漏极电流(ID)、跨导(gm)、跨导产生因子(TGF)、固有增益、输出电阻(route)、截止频率、最大振荡频率(fmax)等模拟/射频参数的影响。结果表明,通过选择低值的后门工作函数,可以提高模拟/射频性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of back gate work function for enhancement of analog/RF performance of AJDMDG Stack MOSFET

In this work, the impact of back gate work function on analog/RF performance of Asymmetric Junctionless Dual Material Double Gate MOSFET with high K gate Stack (AJDMDG Stack MOSFET) has been studied. The impact of back gate work function on analog/RF parameters like drain current (ID), transconductance (gm), transconductance generation factor (TGF), intrinsic gain, output resistance (rout), cut-off frequency, maximum frequency of oscillation (fmax) etc. have been studied through TCAD device simulator. The results reveal that an improvement in analog/RF performance has been achieved by choosing a low value work function of the back gate.

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