光电用稳定无氰金-锡电镀溶液的研制

F. Huang, Yawei Liu, Mingliang L. Huang
{"title":"光电用稳定无氰金-锡电镀溶液的研制","authors":"F. Huang, Yawei Liu, Mingliang L. Huang","doi":"10.1109/ICEPT.2016.7583191","DOIUrl":null,"url":null,"abstract":"A highly stable non-cyanide electroplating bath which can maintain clear at least one month was developed based on Au(III)-Sn(II) using 5,5-dimetheyl-hydantoin (DMH) and pyrophosphate as complexes. The combination of DMH and pyrophosphate can effectively minimize the difference of the deposition potentials between Au and Sn, making the codeposition of Au-Sn alloys possible. The cyclic voltammetry (CV) curve revealed that the codeposition of Au and Sn occurred at the potential of -790mV with a peak potential of -900mV. Pulsed plating was employed to optimize the morphology and composition of Au-Sn alloy films. The effects of pulse frequency, duty percentage and peak current density on the morphology and composition of the deposits were investigated. The compact Au-Sn eutectic alloy with Sn content controlled from 10 at.% to 50 at.% can be obtained. The Au-Sn deposits were characterized by the scanning electron microscopic (SEM) and energy-dispersive spectroscopic (EDS) analyses.","PeriodicalId":6881,"journal":{"name":"2016 17th International Conference on Electronic Packaging Technology (ICEPT)","volume":"21 6","pages":"538-541"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Development of a stable non-cyanide gold-tin electroplating solution for optoelectronic applications\",\"authors\":\"F. Huang, Yawei Liu, Mingliang L. Huang\",\"doi\":\"10.1109/ICEPT.2016.7583191\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A highly stable non-cyanide electroplating bath which can maintain clear at least one month was developed based on Au(III)-Sn(II) using 5,5-dimetheyl-hydantoin (DMH) and pyrophosphate as complexes. The combination of DMH and pyrophosphate can effectively minimize the difference of the deposition potentials between Au and Sn, making the codeposition of Au-Sn alloys possible. The cyclic voltammetry (CV) curve revealed that the codeposition of Au and Sn occurred at the potential of -790mV with a peak potential of -900mV. Pulsed plating was employed to optimize the morphology and composition of Au-Sn alloy films. The effects of pulse frequency, duty percentage and peak current density on the morphology and composition of the deposits were investigated. The compact Au-Sn eutectic alloy with Sn content controlled from 10 at.% to 50 at.% can be obtained. The Au-Sn deposits were characterized by the scanning electron microscopic (SEM) and energy-dispersive spectroscopic (EDS) analyses.\",\"PeriodicalId\":6881,\"journal\":{\"name\":\"2016 17th International Conference on Electronic Packaging Technology (ICEPT)\",\"volume\":\"21 6\",\"pages\":\"538-541\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 17th International Conference on Electronic Packaging Technology (ICEPT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICEPT.2016.7583191\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 17th International Conference on Electronic Packaging Technology (ICEPT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEPT.2016.7583191","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

以金(III)-锡(II)为基料,以5,5-二甲基氢脲(DMH)和焦磷酸盐为配合物,研制了一种高稳定的无氰电镀液,可保持清洁至少一个月。DMH和焦磷酸盐的结合可以有效地减小Au和Sn的沉积电位差异,使Au-Sn合金的共沉积成为可能。循环伏安(CV)曲线显示,Au和Sn的共沉积发生在-790mV电位下,峰值电位为-900mV。采用脉冲镀的方法优化了金-锡合金薄膜的形貌和组成。研究了脉冲频率、占空比和峰值电流密度对镀层形貌和成分的影响。致密的金-锡共晶合金,锡含量控制在10at以内。%到50%。%可以得到。利用扫描电镜(SEM)和能谱分析(EDS)对金矿床进行了表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of a stable non-cyanide gold-tin electroplating solution for optoelectronic applications
A highly stable non-cyanide electroplating bath which can maintain clear at least one month was developed based on Au(III)-Sn(II) using 5,5-dimetheyl-hydantoin (DMH) and pyrophosphate as complexes. The combination of DMH and pyrophosphate can effectively minimize the difference of the deposition potentials between Au and Sn, making the codeposition of Au-Sn alloys possible. The cyclic voltammetry (CV) curve revealed that the codeposition of Au and Sn occurred at the potential of -790mV with a peak potential of -900mV. Pulsed plating was employed to optimize the morphology and composition of Au-Sn alloy films. The effects of pulse frequency, duty percentage and peak current density on the morphology and composition of the deposits were investigated. The compact Au-Sn eutectic alloy with Sn content controlled from 10 at.% to 50 at.% can be obtained. The Au-Sn deposits were characterized by the scanning electron microscopic (SEM) and energy-dispersive spectroscopic (EDS) analyses.
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