{"title":"硅衬底AlN缓冲层Al0.68Sc0.32N表面声波谐振器的高耦合系数谐振模式","authors":"Zichen Tang, Michael D’Agati, R. Olsson","doi":"10.1109/IFCS-ISAF41089.2020.9234828","DOIUrl":null,"url":null,"abstract":"We report on a resonance mode with high electro-mechanical coupling coefficient (kt 2) in an Aluminum Scandium Nitride (AlScN) Surface Acoustic Wave (SAW) resonator with an Aluminum Nitride (AlN) buffer layer on a silicon substrate. We demonstrate the influence of electrode material, electrode thickness, AlScN thickness, and device orientation on the kt 2. We utilize the optimized parameters from this study to realize SAW devices in a CMOS compatible fabrication process and measured a kt 2 as high as 4.78%, which is a high value for AlScN SAW devices reported on low cost single crystal silicon substrates.","PeriodicalId":6872,"journal":{"name":"2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF)","volume":"61 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High Coupling Coefficient Resonance Mode in Al0.68Sc0.32N Surface Acoustic Wave Resonator with AlN Buffer Layer on a Silicon Substrate\",\"authors\":\"Zichen Tang, Michael D’Agati, R. Olsson\",\"doi\":\"10.1109/IFCS-ISAF41089.2020.9234828\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report on a resonance mode with high electro-mechanical coupling coefficient (kt 2) in an Aluminum Scandium Nitride (AlScN) Surface Acoustic Wave (SAW) resonator with an Aluminum Nitride (AlN) buffer layer on a silicon substrate. We demonstrate the influence of electrode material, electrode thickness, AlScN thickness, and device orientation on the kt 2. We utilize the optimized parameters from this study to realize SAW devices in a CMOS compatible fabrication process and measured a kt 2 as high as 4.78%, which is a high value for AlScN SAW devices reported on low cost single crystal silicon substrates.\",\"PeriodicalId\":6872,\"journal\":{\"name\":\"2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF)\",\"volume\":\"61 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IFCS-ISAF41089.2020.9234828\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 Joint Conference of the IEEE International Frequency Control Symposium and International Symposium on Applications of Ferroelectrics (IFCS-ISAF)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IFCS-ISAF41089.2020.9234828","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High Coupling Coefficient Resonance Mode in Al0.68Sc0.32N Surface Acoustic Wave Resonator with AlN Buffer Layer on a Silicon Substrate
We report on a resonance mode with high electro-mechanical coupling coefficient (kt 2) in an Aluminum Scandium Nitride (AlScN) Surface Acoustic Wave (SAW) resonator with an Aluminum Nitride (AlN) buffer layer on a silicon substrate. We demonstrate the influence of electrode material, electrode thickness, AlScN thickness, and device orientation on the kt 2. We utilize the optimized parameters from this study to realize SAW devices in a CMOS compatible fabrication process and measured a kt 2 as high as 4.78%, which is a high value for AlScN SAW devices reported on low cost single crystal silicon substrates.