用于12/16-Hi高带宽存储器(HBM)的低温SoIC™键合和堆叠技术

C. Tsai, T. Ku, M.F. Chen, W. Chiou, C. Wang, Douglas C. H. Yu
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引用次数: 1

摘要

提出并演示了一种采用低温SoIC键合和堆叠技术的12高(12-Hi)芯片堆栈,用于HBM的应用。测试了12-Hi结构中包含超过10,000个tsv和键的菊花链。得到了线性I-V曲线,证明了良好的键合和堆叠质量。建立了从基本逻辑芯片到顶层DRAM的电气链路,以研究带宽和功耗。与$\mu \ maththrm {bump}$技术相比,采用SoIC技术的12-Hi和16-Hi结构的带宽分别提高了18%和20%,功率效率分别提高了8%和15%。此外,12-Hi和16-Hi的soic键结构的热性能分别提高了7%和8%。基于所提出的技术,展望了键距可扩展到10 $\mu\ mathm {m}$以下,模具厚度可更薄。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low Temperature SoIC™ Bonding and Stacking Technology for 12/16-Hi High Bandwidth Memory (HBM)
A 12-high (12-Hi) die stack using low temperature SoIC bonding and stacking technology is presented and demonstrated for the application of HBM. The daisy chains in the 12-Hi structure incorporating over ten thousand TSVs and bonds are tested. Liner I-V curves are obtained to demonstrate the good bonding and stacking quality. The electrical link from a base logic die to top DRAM is built up to study the bandwidth and power consumption. Compared to $\mu \mathrm{bump}$ technology, the bandwidth for 12-Hi and 16-Hi structure using the SoIC technology shows the improvement of 18% and 20%, respectively and the power efficiency demonstrates the improvement of 8% and 15%, respectively. Also, the thermal performance for the 12-Hi and 16-Hi SoIC-bond structures are improved by 7% and 8%, respectively. Based on the proposed technologies, the scalability of bond pitch to sub-ten $\mu\mathrm{m}$ and die thickness to be thinner is prospected.
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