{"title":"等离子化学气相沉积中石墨烯生长过程的偏振分析监测;等离子化学气相沉积中石墨烯生长过程的偏振分析监测;Ellipsometric Monitoring of First Stages of Graphene Growth in plasma -增强化学装置deposition","authors":"Yasuaki Hayashi, Satoshi Ishidoshiro, Shinya Yamada, Yuma Kawamura","doi":"10.3131/JVSJ2.60.135","DOIUrl":null,"url":null,"abstract":"Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the ˆrst stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the CD coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"7 1","pages":"135-138"},"PeriodicalIF":0.0000,"publicationDate":"2017-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;Ellipsometric Monitoring of First Stages of Graphene Growth in Plasma-Enhanced Chemical Vapor Deposition\",\"authors\":\"Yasuaki Hayashi, Satoshi Ishidoshiro, Shinya Yamada, Yuma Kawamura\",\"doi\":\"10.3131/JVSJ2.60.135\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the ˆrst stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the CD coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.\",\"PeriodicalId\":17344,\"journal\":{\"name\":\"Journal of The Vacuum Society of Japan\",\"volume\":\"7 1\",\"pages\":\"135-138\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of The Vacuum Society of Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3131/JVSJ2.60.135\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of The Vacuum Society of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3131/JVSJ2.60.135","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;プラズマ化学気相堆積におけるグラフェン成長過程の偏光解析モニタリング;Ellipsometric Monitoring of First Stages of Graphene Growth in Plasma-Enhanced Chemical Vapor Deposition
Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the ˆrst stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the CD coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.
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