量子化平面锗结构光发射的物理基础和特性

R. Venkatasubramanian, D. Malta, M. Timmons, J. Hutchby
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引用次数: 1

摘要

量子化平面Ge结构的发光特性随时间稳定,与激光功率激发和温度有关,存在GaAs-Al/sub 0.8/Ga/sub 0.2/As覆盖层。在300 K附近,一个1.7 eV的单一宽发射被观测到在77 K时变成了2.16 eV、2.01 eV、1.696 eV和1.56 eV的四个不同的发射。还提出了一个描述小锗结构发光基础的模型。量子化结构中辐射复合的可能性增加是由于k空间中导带和价带的状态比体锗中的状态关闭。因此,在量子化结构中,1.7 eV的发光可能是由一个或两个声子辅助过程产生的,而在体锗中,0.7 eV的光致发光则是由4-5个声子辅助过程产生的
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Physical basis and characteristics of light emission from quantized planar Ge structures
The characteristics of luminescence from quantized planar Ge structures are presented, showing stability with time, dependence on laser power excitation and temperature, and the presence of GaAs-Al/sub 0.8/Ga/sub 0.2/As overlayers. A single broad emission at 1.7 eV near 300 K is observed to become four distinct emissions at 2.16 eV, 2.01 eV, 1.696 eV, and 1.56 eV at 77 K. A model describing the basis of luminescence in small Ge structures is also presented. The increased probability for radiative recombination in the quantized structures is a result of states in the conduction band and valence band being closed in k-space than in bulk Ge. Thus, the luminescence at 1.7 eV in the quantized structures probably results from a one or two phonon-assisted process compared to a 4-5 phonon process in bulk Ge for photoluminescence at 0.7 eV.<>
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