电源和模拟器件趋势、挑战:植入和热处理应用

T. Kuroi
{"title":"电源和模拟器件趋势、挑战:植入和热处理应用","authors":"T. Kuroi","doi":"10.1109/IIT.2014.6940046","DOIUrl":null,"url":null,"abstract":"Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.","PeriodicalId":6548,"journal":{"name":"2014 20th International Conference on Ion Implantation Technology (IIT)","volume":"30 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Power and analog devices trends, challenges: Implant and thermal processing applications\",\"authors\":\"T. Kuroi\",\"doi\":\"10.1109/IIT.2014.6940046\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.\",\"PeriodicalId\":6548,\"journal\":{\"name\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"volume\":\"30 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2014.6940046\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 20th International Conference on Ion Implantation Technology (IIT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2014.6940046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

电力设备有助于建立一个智慧社区,在这个社区中,人类和地球可以共同繁荣。模拟和传感设备作为微型计算机的输入和输出接口,提供适合扩展智能解决方案的整体系统。这些器件采用了较为成熟的工艺技术。然而,独特的工艺技术最近被用来提高这些设备的性能。尤其是离子注入和退火技术,因为结的形成是决定器件性能的最重要的技术。在本文中,我将报告电源和模拟器件的技术趋势、当前问题以及克服这些问题的一些解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Power and analog devices trends, challenges: Implant and thermal processing applications
Power devices contribute to the building of a smart community in which people and the planet can coexist in prosperity. Analog and sensing devices as input and output interface to microcomputer provide total systems appropriate to expand smart solutions. Relatively matured process technology was used to fabricate these devices. However unique process techniques have recently been utilized to improve the performance of these devices. Especially, an increasing amount of attention has been devoted to ion implantation and annealing technology, since junction formation is the most important technology that can determine the device performance. In this paper, I will report on the technology trends, the current issues and some solutions to overcome these for power and analog devices.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信