快速重离子辐照金属/半导体器件电导率类型变化的观察

S. P. Pandey
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引用次数: 1

摘要

用能量~100MeV的Au(7+)和Si(8+)离子(10 10 ~10 13离子/ cm2)辐照金属/半导体(n型和p型)器件。从辐照前后器件的I-V和C-V特性研究了器件的电子特性。对辐照后的器件进行了氢化处理,以研究辐照诱导缺陷的氢钝化效应。将器件退火至400°C,并在每个退火温度下进行红外光谱研究,以研究辐照诱导缺陷的性质。本文从辐照后电子器件的辐射硬度和电导率类型变化的角度对结果进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Observation of Conductivity Type Change in Swift Heavy Ion Irradiated Metal/Semiconductor Devices
Metal/Semiconductor (n-type & p-type) devices were irradiated with Au(7+) and Si(8+) ions of energy ~100MeV with different fluencies (10 10 - 10 13 ions/cm 2 ). Electronic properties have been studied from I-V and C-V characteristics of the devices before and after the irradiation. Hydrogenation of the irradiated devices has also been performed to investigate the hydrogen passivation effect of the irradiation induced defects. The devices were annealed upto 400°C and Infrared spectroscopic studies have been carried out at each annealing temperatures to study the nature of irradiation induced defects. The result has been discussed in the realm of radiation hardness and the conductivity type change of the irradiated electronic devices.
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