溅射过程中稳态压力分布和动态压力波动的测量

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.220

Shuichi Tajiri, T. Onishi, Yukiko Okano, S. Ogawa, H. Mima

{"title":"溅射过程中稳态压力分布和动态压力波动的测量","authors":"Shuichi Tajiri, T. Onishi, Yukiko Okano, S. Ogawa, H. Mima","doi":"10.3131/JVSJ2.60.220","DOIUrl":null,"url":null,"abstract":"Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process Shuichi TAJIRI1, Takanori ONISHI1, Yukiko OKANO1, Soichi OGAWA2 and Hiroshi MIMA3 1Okano Works, Ltd., Micro sensor Division, 6229 Izuo, Taisyo-ku, Osaka-shi, Osaka 5510031, Japan 2Ogawa Creation Research Laboratory, 7187 Karigutidai, Tarumi-ku, Kobe-shi, Hyogo 6550049, Japan 3Osaka City University, 33138 Sugimoto, Sumiyoshi-ku, Osaka-shi, Osaka 5588585, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process\",\"authors\":\"Shuichi Tajiri, T. Onishi, Yukiko Okano, S. Ogawa, H. Mima\",\"doi\":\"10.3131/JVSJ2.60.220\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process Shuichi TAJIRI1, Takanori ONISHI1, Yukiko OKANO1, Soichi OGAWA2 and Hiroshi MIMA3 1Okano Works, Ltd., Micro sensor Division, 6229 Izuo, Taisyo-ku, Osaka-shi, Osaka 5510031, Japan 2Ogawa Creation Research Laboratory, 7187 Karigutidai, Tarumi-ku, Kobe-shi, Hyogo 6550049, Japan 3Osaka City University, 33138 Sugimoto, Sumiyoshi-ku, Osaka-shi, Osaka 5588585, Japan\",\"PeriodicalId\":17344,\"journal\":{\"name\":\"Journal of The Vacuum Society of Japan\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of The Vacuum Society of Japan\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3131/JVSJ2.60.220\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of The Vacuum Society of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3131/JVSJ2.60.220","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

测量稳态压力分布和动态压力波动在溅射过程中就秀一1,Takanori馆1,Yukiko冈1,国际OGAWA2和Hiroshi米玛31绒,有限公司,微传感器部门6229 Izuo Taisyo-ku, Osaka-shi, 5510031年大阪,日本2 OGAWA创建研究实验室,7187 Karigutidai Tarumi-ku, Kobe-shi,兵库县655年至0049年,日本大阪市立大学的3、3138杉,Sumiyoshi-ku, Osaka-shi,日本大阪5588585

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process

Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process Shuichi TAJIRI1, Takanori ONISHI1, Yukiko OKANO1, Soichi OGAWA2 and Hiroshi MIMA3 1Okano Works, Ltd., Micro sensor Division, 6229 Izuo, Taisyo-ku, Osaka-shi, Osaka 5510031, Japan 2Ogawa Creation Research Laboratory, 7187 Karigutidai, Tarumi-ku, Kobe-shi, Hyogo 6550049, Japan 3Osaka City University, 33138 Sugimoto, Sumiyoshi-ku, Osaka-shi, Osaka 5588585, Japan

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Journal of The Vacuum Society of Japan

自引率

0.00%

发文量