双栅p-GaN/AlGaN/GaN HEMT双向开关的TCAD仿真

Fan Li, Yubo Wang, Chenjie Yuan, Ruize Sun, Chengmurong Ding, Miao Cui, Yinchao Zhao, H. Wen, Wen Liu
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引用次数: 1

摘要

双向开关在交-交矩阵变换器和其他电力电子领域具有很大的应用潜力。本文系统地进行了p-GaN/AlGaN/GaN高电子迁移率晶体管(HEMT)双栅双向开关的TCAD仿真。给出了静态I-V特性和双向导通能力,证明了模型的成功建立。这些结果与以往文献的趋势一致。在器件总尺寸不变的情况下,通过改变两个栅极之间的分离距离,在栅极电压为0V的情况下,将断态击穿电压提高到1571V。仿真结果为提高单片GaN双向开关在高压应用中的性能指明了方向。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
TCAD Simulation of Dual-Gate p-GaN/AlGaN/GaN HEMT Bidirectional Switch
The bidirectional switch has great potential in AC-AC matrix converter and other power electronics areas. In this work, the TCAD simulation of p-GaN/AlGaN/GaN High Electron Mobility Transistor (HEMT)dual-gate bidirectional switch is systematically carried out. The static I-V characteristics and the bidirectional conduction ability are presented to prove the successful establishment of our model. These results are consistent with the trends from previous literature. By changing the separation distance between two gates when the device's total size remains the same, the off-state breakdown voltage is improved to 1571V under gate voltage of 0V. The simulation points out the direction to improve the performance of monolithic GaN bidirectional switches in high voltage applications.
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