用于高性能光电探测器的卤化物辅助CVD生长WSe2的多体相互作用

A. S. Bandyopadhyay, K. Jayanand, A. Kaul
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引用次数: 1

摘要

半导体二维(2D)材料基器件的实际应用依赖于化学气相沉积(CVD)方法的大面积生长。由于钨的高升华点,控制二硒化钨(WSe2)的CVD生长通常具有挑战性。在这项工作中,我们使用NaCl和氧化钨在~ 750℃的温度(T)下生长单层(1L) WSe2。此外,我们利用t依赖PL光谱分析了1L WSe2中激子、三角子和局域激子态的动力学。此外,我们还制作了Al/WSe2基光电探测器(PD),其灵敏度高达~ 502 a /W。分析了PD的频率相关电容响应,计算出界面阱密度Dit为~ 3.45 × 1012 cm-2 eV-1;这是迄今为止基于wse2的设备报告的最低Dit值。这项工作的结果揭示了WSe2在电子、光电器件应用方面的巨大潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Many-body Interactions in Halide-assisted CVD Grown WSe2 for High Performance Photodetectors
Practical device applications of semiconducting two-dimensional (2D) materials based devices rely on their large area growth using Chemical Vapor Deposition (CVD) method. Controlled CVD growth of tungsten diselenide (WSe2) is often challenging because of the high sublimation point of tungsten. In this work, we used NaCl with tungsten oxide to allow the growth of monolayer (1L) WSe2 at a temperature (T) of ~ 750°C. Additionally, we utilized T-dependent PL spectroscopy to analyse the dynamics of excitons, trions and localized excitons states in 1L WSe2. Moreover, we fabricated Al/WSe2 based photodetector (PD) which show a high responsivity of ~ 502 A/W. The frequency-dependent capacitance response of the PD was also analyzed from which an interface trap density Dit was computed to be ~ 3.45 × 1012 cm-2 eV-1; this is the lowest Dit value reported for WSe2-based devices to date. The results obtained in this work reveals great potential of WSe2 for electronic, opto-electronic device applications.
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