AgInSe2薄膜结构、光学和电学性质的研究

I. Khudayer, B. Ali, M. H. Mustafa, A. J. Ibrahim
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引用次数: 6

摘要

在室温下,利用热蒸发技术在玻璃衬底上制备了厚度为(3001±20)nm的硒化银铟(AgInSe2) (AIS)薄膜,沉积速率为(3±0.1)nm2sec。在不同的退火温度(Ta=450、550和650)k下,研究了合金的结构、光学和电学性能。用能谱仪(EDS)技术验证了合金中元素(Ag、In、Se)的含量。x射线衍射分析表明,制备的AIS合金为粉末,其薄膜为具有择优取向的四边形结构的多晶(112)。晶粒尺寸随退火温度的增加而增大。利用原子力显微镜(AFM)技术对膜的形貌进行了检测,并对膜的表面粗糙度和平均晶粒尺寸进行了估计。结果表明,随着退火温度的升高,晶粒尺寸逐渐增大。薄膜的光学带隙在1.6 ~ 1.9 eV之间。薄膜呈n型,表明电子是主要的电荷载流子。电导率随着退火温度的相应升高而增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of the Structural, Optical and Electrical Properties of AgInSe2 Thin Films
The Silver1Indium1Selenide (AgInSe2) (AIS) thin1films of (3001±20) nm thickness  have been1prepared2from the compound alloys2using thermal evaporation2 technique onto the glass2substrate at room temperature, with a deposition rate2(3±0.1) nm2sec-1. The2structural, optical and electrical3properties have been studied3at different annealing3temperatures (Ta=450, 550 and 650) K. The amount3or (concentration) of the elements3(Ag, In, Se) in the  prepared alloy3was verified using  an energy dispersive3x-ray spectrometer (EDS)3technology. X-ray diffraction3analysis shows that AIS alloy  prepared as (powder) and the thin films3are polycrystalline  of tetragonal3structure with preferential orientation3(112). The crystalline3size increases  as a function3of annealing temperature. The atomic force3microscope (AFM) technique  was used to examine3the  topography  and  estimate3the surface roughness, also the  average grain3size of the films. The results show3that the grain size increases3with annealing3temperature.   The optical4band gap of the films lies4in the range 1.6-1.9 eV. The films4appear to be4n-type indicating that the electrons4as a dominant charge4carrier. The electrical conductivity4increases  with a corresponding4increase in annealing4temperature.
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