基于拓扑绝缘体的超低功耗非易失性存储器设计探索

Yuhao Wang, Hao Yu
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引用次数: 4

摘要

拓扑绝缘体(Topological insulator, TI)是近年来发现的一种本体具有绝缘体特性,表面具有金属特性的纳米器件。由于TI器件中的状态信息是由有序自旋传递的,因此在超低功耗计算中引起了极大的兴趣。本文展示了用于非易失性存储器(NVM)设计的TI器件的状态空间建模和设计探索。在一个类似spice的模拟器中提取和建模TI中的非传统电态。该模型可用于CMOS-TI混合NVM的存储单元和存储阵列设计探索。实验结果表明,基于TI的NVM具有低至20ns的快速读写延迟。此外,与其他新兴的NVM技术相比,它的运行能量降低了几个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design exploration of ultra-low power non-volatile memory based on topological insulator
Topological insulator (TI) is recently discovered nano-device whose bulk acts as insulator but surface behaves as metal. As state information in a TI device is conducted by ordered spins, it draws tremendous interest for ultra-low power computing. This paper shows a state-space modeling and design exploration of TI device for non-volatile memory (NVM) design. The non-traditional electrical state in TI is extracted and modeled in a SPICE-like simulator. The model is the employed for hybrid CMOS-TI NVM design explorations for both memory cell and memory array. The experiment results show that TI based NVM exhibits a fast write and read latency as low as 20ns. In addition, compared to other emerging NVM technologies, it exhibits several orders of magnitude lower operation energy.
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