亚20nm自旋转矩转移磁随机存取存储器技术的互连缩放挑战

T. Min, Z. Tokei, G. Kar, S. Coseman, J. Bekaert, P. Raghavan, S. Cornelissen, Kaidong Xu, L. Souriau, D. Radisic, J. Swerts, T. Tahmasebi, S. Mertens
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引用次数: 3

摘要

讨论了STT-MRAM读取操作降至20nm以下的缩放挑战。研究了MTJ细胞电阻变化的各种影响因素,重点研究了由于光刻图像化技术和互连引起的MRAM细胞的变化。使用EUV SADP或单次打印工艺,MRAM单元尺寸可以缩小到18nm物理尺寸,单元面积变化为4.2% sigma/ave。对于互连来说,随着尺寸的缩小,电阻的变化越来越大,这是最大的挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interconnects scaling challenge for sub-20nm spin torque transfer magnetic random access memory technology
The scaling challenges of STT-MRAM read operation down to sub-20nm is discussed. Various contributing factors to the MTJ cell resistance variation were investigated with focus on MRAM cell variation due to lithography patterning technique and interconnects. With EUV SADP or single print process, the MRAM cell size can be scaled down to 18nm physical dimension with 4.2% sigma/ave cell area variation. For interconnects, the increasing resistance variation with shrinking dimensions poses most of the challenges.
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