日本光学MEMS的研究活动

H. Fujita
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引用次数: 0

摘要

MEMS(微机电系统)技术的关键概念是扩展超大规模集成电路的制造能力,实现由电、机械、化学和光学元件组成的三维微系统。利用光刻、薄膜沉积和蚀刻等VLSI制造工艺,可以大量获得亚微米精度的结构,并且彼此之间具有良好的对准性。此外,微镜和开关等可移动结构可以通过微加工工艺制造。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Research activities of optical MEMS in Japan
The key concept of MEMS (micro electro mechanical systems) technologies is to extend the VLSI fabrication capability to realize three- dimensional micro systems which are composed of electrical, mechanical, chemical and optical elements. Using VLSI fabrication processes such as photolithography, film deposition and etching, it is possible to obtain sub-micrometer-precision structures in a large quantity with excellent alignment between each other. In addition, movable structures such as micro mirrors and switches can be made by micromachining processes.
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