Zr-硅酸盐MISFET中Zr浓度增加对电流可驱动性的影响

T. Yamaguchi, H. Satake, N. Fukushima
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引用次数: 8

摘要

采用低冲击脉冲激光烧蚀沉积方法制备了不同Zr浓度的硅酸锆薄膜,具有相同的薄界面层和光滑的Si界面。通过这些硅酸锆样品,首次区分了硅界面性质和硅酸锆中体积电荷对电流可驱动性的影响。研究发现,即使界面态密度很小,zr -硅酸盐介质中的体积电荷也会极大地影响misfet的电流可驱动性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation of current drivability by the increase of Zr concentrations in Zr-silicate MISFET
Zr-silicate thin films with different Zr concentrations, fabricated by low impact pulsed laser ablation deposition, have identically thin interface layers and smooth Si interfaces. By using these Zr-silicate samples, the influence of Si interface properties and that of bulk charges in the Zr-silicate on current drivability were distinguished for the first time. It was found that bulk charges in the Zr-silicate dielectrics greatly affect the current drivability of MISFETs, even if the interface-state density is small.
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