叠氮化物电解质中钒的电化学行为与含卤素离子电解质行为的比较

A. Ghoneim
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引用次数: 1

摘要

采用开路电位(OCP)、动电位极化和电化学阻抗谱(EIS)技术研究了叠氮化物离子浓度和温度对钒电化学行为的影响。稳态电位(Ess)是叠氮离子浓度的线性函数。极化测量表明,随着叠氮离子浓度的增加和溶液温度的升高,腐蚀速率增加。开路条件下的EIS研究证实了这些结果,可以通过极化电阻(Rox)和氧化物厚度(1/Cox)随叠氮离子浓度的增加而降低来识别。采用具有复杂传递函数的恒相元(CPE)模型对测量阻抗响应进行了分析。钒在叠氮化物介质中的行为也与在其他卤化物溶液中的行为进行了比较,发现自发生长较厚的氧化膜的趋势依次为:Br - > Cl - > I - > n3 > F -。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrochemical Behavior of Vanadium in Azide Electrolyte inComparison with the Behavior in Halogen Ions-Containing Electrolytes
The influence of azide ion concentration and temperature on the electrochemical behavior of vanadium was studied using open-circuit potential (OCP), potentiodynamic polarization and electrochemical impedance spectroscopy (EIS) techniques. The steady state potential (Ess) is a linear function of azide ion concentration. Polarization measurements have shown that the rate of corrosion icorr increases with increasing the azide ion concentration as well as increasing solution temperature. EIS investigations under open-circuit conditions confirm these results as can be identified by the decrease of the polarization resistance (Rox) and oxide thickness (1/Cox) with increasing the azide ion concentration. The measured impedance responses were analyzed using a constant phase element (CPE) model with its complex transfer function. The behavior of vanadium in the azide medium is also compared to that in other halide salt solutions, it was found that the tendency for spontaneously grown thicker oxide film increases in the order: Br - > Cl - > I - > N 3 > F - .
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