采用hiims操作的微型晶圆厂溅射沉积设备的开发

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.365

H. Ogiso, K. Yukimura, S. Nakano, Hiroyuki Tanaka, S. Khumpuang, Yuuki Yabuta, Ryuichiro Kamei, S. Hara

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引用次数: 0

摘要

发展微型溅射沉积设备最小的工厂与HiPIMS操作Hisato OGISO1,肯YUKIMURA2,静香NAKANO1)田中2,Sommawan KHUMPUANG2,较YABUTA3,静香Ryuichiro3和Shiro HARA21先进制造研究所,研究所科技工业(产业),121只,Tsukuba-shi,茨城县3058564日本2纳电子学研究所、国家工业科技研究所(巨大),111茨城市筑波市梅津野30585683 se南-kogyo有限公司，4324大阪市住明区北上谷5590011日本

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Development of Miniature Sputtering Deposition Equipment for Minimal Fab with HiPIMS Operations

Development of Miniature Sputtering Deposition Equipment for Minimal Fab with HiPIMS Operations Hisato OGISO1, Ken YUKIMURA2, Shizuka NAKANO1, Hiroyuki TANAKA2, Sommawan KHUMPUANG2, Yuuki YABUTA3, Ryuichiro KAMEI3 and Shiro HARA2 1Advanced Manufacturing Research Institute, National Institute of Industrial Science and Technology (AIST), 121 Namiki, Tsukuba-shi, Ibaraki 3058564 Japan 2Nanoelectronics Research Institute, National Institute of Industrial Science and Technology (AIST), 111 Umezono, Tsukuba-shi, Ibaraki 3058568, Japan 3Seinan-kogyo Co., Ltd., 4324 Kitakagaya, Summinoe-ku, Osaka-shi, Osaka 5590011 Japan

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Journal of The Vacuum Society of Japan

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