基于22nm FinFET低功耗(22FFL)技术的550mv SRAM设计

Daeyeon Kim, J. Wiedemer, P. Kolar, Ayushi Shrivastava, Jinal Shah, Satyanand Nalam, Gwanghyeon Baek, Xiaofei Wang, Z. Guo, E. Karl
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引用次数: 3

摘要

超低工作电压(VMIN) SRAM阵列已经在22nm FinFET低功耗技术(22FFL)上得到了验证[1]。通过优化无药SRAM晶体管并应用行业标准的写辅助技术,16Mb的0.087μm2高密度位单元(HDC)阵列和32Mb的0.107μm2高电流位单元(HCC)阵列在-10°C至95°C的温度范围内分别实现了505mV和450mV的95个百分点的VMIN。集成在6-T HDC SRAM位单元阵列中的自诱导崩溃(SIC)写入辅助系统,相对于无辅助阵列,可将VMIN降低110mV,降低95个百分点,而功率开销可以忽略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sub-550mV SRAM Design in 22nm FinFET Low Power (22FFL) Technology with Self-Induced Collapse Write Assist
Exceptionally low minimum operating voltage (VMIN) SRAM arrays have been demonstrated on 22nm FinFET low power technology (22FFL) [1]. By optimizing an undoped SRAM transistor and applying industry standard write assist techniques, 16Mb array of 0.087μm2 high-density bitcell (HDC) and 32Mb array of 0.107μm2 high-current bitcell (HCC) achieve the 95th percentile VMIN of 505mV and 450mV respectively across a temperature range of -10°C to 95°C. A self-induced collapse (SIC) write assist integrated into the 6-T HDC SRAM bitcell array enables 110mV VMIN reduction relative to an unassisted array at the 95th percentile with negligible power overhead.
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