在FinFET技术中RC紧角测试结构设计和硅表征

Lijie Sun, Mengying Zhang, Guangxing Wan, W. Wong, Zhen Zhou, Xiaojin Li, Yabin Sun, Yanling Shi
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引用次数: 0

摘要

在这项工作中,我们提出了一种新型的RC收紧角测试结构。在该测试结构中,集成到RO(环形振荡器)中的寄生RC DUTs(在测设计)被设计用于验证和校准MEOL(中线端)和BEOL(后线端)RC收紧角;另一方面,采用可寻址阵列电路来避免前端线晶体管局部变化所引起的噪声。通过试验结构硅数据,对统计仿真得到的RC拧紧角进行了迭代和更新
本文章由计算机程序翻译,如有差异,请以英文原文为准。
RC Tightened Corner Test structure Design and Silicon Characterization in FinFET Technology
In this work, we propose a novel RC tightened corner test structure for FinFET Technology. In this test structure, Parasitic RC DUTs (Design Under Test) integrated into RO (Ring Oscillator) have been designed to verify and calibrate MEOL (Mid-End-Of-Line) and BEOL (Back-End-Of-Line) RC tightened corner; On the other hands, addressable-array circuit has been used to avoid noise induced by the local variation of FEOL (Front-End-Of-Line) transistors. By the test structure silicon data, RC tightened corners generated from statistical simulation have been iterated and updated
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