微孔金表面二次电子产率的角依赖性

J. Ludwick, A. Iqbal, D. Gortat, J. D. Cook, M. Cahay, Peng Zhang, T. Back, S. Fairchild, M. Sparkes, W. O'Neill
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引用次数: 14

摘要

我们报告了包含微孔阵列的金膜的二次电子产率(SEY)作为一次电子入射角的函数的详尽测量。SEY测量结果与蒙特卡罗(MC)模拟结果非常吻合。本文还提出了一种高度精确的经验拟合方法来拟合入射电子撞击角的函数。在本研究中,微孔的纵横比(孔隙高度与孔径之比)约为1.5 ~ 3.5。详细分析了孔隙阵列密度(孔隙率)和孔隙纵横比的影响。研究发现,增大孔隙宽高比和孔隙度会导致总SEY急剧降低,这与MC模拟结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Angular dependence of secondary electron yield from microporous gold surfaces
We report exhaustive measurements of the secondary electron yield (SEY) from a gold film containing an array of micropores as a function of the angle of incidence of the primary electrons. The SEY measurements are in good agreement with Monte-Carlo (MC) simulations. A highly accurate empirical fit to the SEY data as a function of the incident electron impact angle is also proposed. In this study, the micropores have aspect ratios (ratio of pore height over pore diameter) ranging from about 1.5 to 3.5. The effect of the pore array density (porosity) and pore aspect ratio is analyzed in greater detail. It is found that increasing the pore aspect ratio and porosity leads to a sharp reduction in the total SEY in agreement with MC simulations.
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