{"title":"对两种不同离子注入WC-Co刀具后相似深度剖面的建模，用于木质材料加工","authors":"M. Barlak, J. Wilkowski, Zbigniew Werner","doi":"10.5604/01.3001.0053.8668","DOIUrl":null,"url":null,"abstract":"Modelling of the similar depth profiles of two different kinds of ions, implanted to WC-Co tools, used in wood-based material machining. An attempt was made to model the similar depth profiles of ions of two commonly used gases, i.e., nitrogen and argon, for the parameter values possible to obtain using classical implanters. Modelling was executed in two stages. Similar profiles were obtained for the acceleration voltage value of 35 kV in the case of nitrogen and the sum of the acceleration voltages of 65+32.5 kV in the case of argon. The difference in the obtained profile parameter values, such as: the peak volume dopant concentration of the implanted element, the projected range and the range straggling, was less than 1%.","PeriodicalId":8020,"journal":{"name":"Annals of WULS, Forestry and Wood Technology","volume":"82 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-06-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Modelling of the similar depth profiles of two different kinds of ions,implanted to WC-Co tools, used in wood-based material machining\",\"authors\":\"M. Barlak, J. Wilkowski, Zbigniew Werner\",\"doi\":\"10.5604/01.3001.0053.8668\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Modelling of the similar depth profiles of two different kinds of ions, implanted to WC-Co tools, used in wood-based material machining. An attempt was made to model the similar depth profiles of ions of two commonly used gases, i.e., nitrogen and argon, for the parameter values possible to obtain using classical implanters. Modelling was executed in two stages. Similar profiles were obtained for the acceleration voltage value of 35 kV in the case of nitrogen and the sum of the acceleration voltages of 65+32.5 kV in the case of argon. The difference in the obtained profile parameter values, such as: the peak volume dopant concentration of the implanted element, the projected range and the range straggling, was less than 1%.\",\"PeriodicalId\":8020,\"journal\":{\"name\":\"Annals of WULS, Forestry and Wood Technology\",\"volume\":\"82 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-06-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Annals of WULS, Forestry and Wood Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.5604/01.3001.0053.8668\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Annals of WULS, Forestry and Wood Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5604/01.3001.0053.8668","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Modelling of the similar depth profiles of two different kinds of ions,implanted to WC-Co tools, used in wood-based material machining
Modelling of the similar depth profiles of two different kinds of ions, implanted to WC-Co tools, used in wood-based material machining. An attempt was made to model the similar depth profiles of ions of two commonly used gases, i.e., nitrogen and argon, for the parameter values possible to obtain using classical implanters. Modelling was executed in two stages. Similar profiles were obtained for the acceleration voltage value of 35 kV in the case of nitrogen and the sum of the acceleration voltages of 65+32.5 kV in the case of argon. The difference in the obtained profile parameter values, such as: the peak volume dopant concentration of the implanted element, the projected range and the range straggling, was less than 1%.
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