等离子体刻蚀微流控芯片钛微模具制造技术的发展

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.145

T. Hitobo, Masahiro Shiroki, H. Nabesawa, T. Asaji, T. Abe

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引用次数: 0

摘要

钛微模具制造技术的发展微‰uidic芯片通过等离子体蚀刻武HITOBO1,Masahiro SHIROKI2,Hirofumi NABESAWA3 Toyohisa ASAJI4和安倍隆51 tateyama机械有限公司,有限公司,30 Shimonoban Toyama-shi,富山930年1305年日本2 richell Corp .) 515年松阴,Nakaniikawagun Kamiichimachi, Toyama-shi,富山930年0357年日本3富山工业技术中心,383的中国人,Toyama-shi,富山930年0866年日本4技术研究所富山学院，富山市弘町13号，富山9398045，日本5新泻大学科学技术研究生院，新泻市西西区Ikarashininocho 8050，新泻市9502181

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Development of Titanium Micro Mold Manufacturing Technology for the Microfluidic Chip by Plasma Etching

Development of Titanium Micro Mold Manufacturing Technology for the Micro‰uidic Chip by Plasma Etching Takeshi HITOBO1, Masahiro SHIROKI2, Hirofumi NABESAWA3, Toyohisa ASAJI4 and Takashi ABE5 1Tateyama Machine Co., Ltd., 30 Shimonoban, Toyama-shi, Toyama 9301305, Japan 2Richell Corp., 515 shoin, Nakaniikawagun Kamiichimachi, Toyama-shi, Toyama 9300357, Japan 3Toyama Industrial Technology Center, 383 Takata, Toyama-shi, Toyama 9300866, Japan 4National Institute of Technology, Toyama College, 13 Hongomachi, Toyama-shi, Toyama 9398045, Japan 5Graduate School of Science and Technology, Niigata University, 8050 Ikarashininocho, Nishi-ku, Niigata-shi, Niigata 9502181, Japan

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Journal of The Vacuum Society of Japan

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