{"title":"从工艺变化到可靠性:纳米时代数字电路时序研究","authors":"Bing Li, M. Hashimoto, Ulf Schlichtmann","doi":"10.2197/ipsjtsldm.11.2","DOIUrl":null,"url":null,"abstract":": In advanced technology nodes, transistors and interconnects with shrinking physical dimensions su ff er large process variations during manufacturing and are prone to reliability issues. These underlying changes require an overhaul of the design methodologies for digital circuits. In this paper, we provide an overview of techniques introduced recently to analyze the e ff ect of uncertainty in manufacturing and reliability issues of devices due to the diminishing feature size. These techniques range from variation / aging modeling to circuit-level analysis. In addition, active techniques to counter these e ff ects, such as clock skew tuning and voltage tuning are also covered in this paper.","PeriodicalId":38964,"journal":{"name":"IPSJ Transactions on System LSI Design Methodology","volume":"51 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2018-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"From Process Variations to Reliability: A Survey of Timing of Digital Circuits in the Nanometer Era\",\"authors\":\"Bing Li, M. Hashimoto, Ulf Schlichtmann\",\"doi\":\"10.2197/ipsjtsldm.11.2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\": In advanced technology nodes, transistors and interconnects with shrinking physical dimensions su ff er large process variations during manufacturing and are prone to reliability issues. These underlying changes require an overhaul of the design methodologies for digital circuits. In this paper, we provide an overview of techniques introduced recently to analyze the e ff ect of uncertainty in manufacturing and reliability issues of devices due to the diminishing feature size. These techniques range from variation / aging modeling to circuit-level analysis. In addition, active techniques to counter these e ff ects, such as clock skew tuning and voltage tuning are also covered in this paper.\",\"PeriodicalId\":38964,\"journal\":{\"name\":\"IPSJ Transactions on System LSI Design Methodology\",\"volume\":\"51 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IPSJ Transactions on System LSI Design Methodology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2197/ipsjtsldm.11.2\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IPSJ Transactions on System LSI Design Methodology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2197/ipsjtsldm.11.2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
From Process Variations to Reliability: A Survey of Timing of Digital Circuits in the Nanometer Era
: In advanced technology nodes, transistors and interconnects with shrinking physical dimensions su ff er large process variations during manufacturing and are prone to reliability issues. These underlying changes require an overhaul of the design methodologies for digital circuits. In this paper, we provide an overview of techniques introduced recently to analyze the e ff ect of uncertainty in manufacturing and reliability issues of devices due to the diminishing feature size. These techniques range from variation / aging modeling to circuit-level analysis. In addition, active techniques to counter these e ff ects, such as clock skew tuning and voltage tuning are also covered in this paper.