Ar-N2微波放电余辉中N和o原子、N2(A)和N2(X, v > 13)亚稳分子和N2+离子密度的测定

A. Ricard, H. Zerrouki, J. Sarrette
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引用次数: 3

摘要

用发射光谱法对Ar-N2流动微波放电的早期余辉进行了表征。通过N和O原子的NO滴定校准和NO和N2波段强度测量,用光学发射光谱测定了N和O原子、N2(A)和N2(X, v > 13)亚稳分子和N2+离子密度。为Ar-xN2气体混合物与×从2增加到100%在4托,100瓦特和余辉时间3×10 - 3 s在5 l反应器入口,发现密度的范围(2 - 6)×1014厘米- 3 n个原子,低一个数量级N2 (X, v > 13)和O-atoms(来自空气杂质),1010 - 1011 cm - 3的N2 (A)和N2 + 108 - 109 cm - 3。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of N and O-Atoms, of N2(A) and N2(X, v > 13) Metastable Molecules and N2+ Ion Densities in the Afterglows of Ar-N2 Microwave Discharges
Early afterglows of Ar-N2 flowing microwave discharges are characterized by optical emission spectroscopy. The N and O atoms, the N2(A) and N2(X, v > 13) metastable molecules and N2+ ion densities are determined by optical emission spectroscopy after calibration by NO titration for N and O-atoms and measurements of NO and N2 band intensities. For an Ar-xN2 gas mixture with × increasing from 2 to 100% at 4 Torr, 100 Watt and an afterglow time of 3 × 10- 3 s at the 5 liter reactor inlet, it is found densities in the ranges of (2 - 6) × 1014 cm- 3 for N-atoms, one order of magnitude lower for N2(X, v > 13) and for O-atoms (coming from air impurity), of 1010 - 1011 cm- 3 for N2(A) and of 108 - 109 cm- 3 for N2+.
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