低栅场下高稳定非晶硅薄膜晶体管寿命预测的两阶段模型

Ting Liu, S. Wagner, J. Sturm
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引用次数: 1

摘要

最近报道的高稳定的a-Si TFTs在直流栅极偏置下具有极长的工作寿命,对于AMOLED显示器中oled的模拟驱动器具有吸引力。在室温下,直流饱和电流降至50%的时间预计为100至1000年。然而,寿命是根据一个月的室温测试,用a- si中缺陷产生的拉伸指数模型来推断的。在这项研究中,我们提出了一个两阶段阈值电压漂移模型,用于从温度相关测量中预测寿命。我们发现(i)“统一拉伸指数拟合”模型从60°C到140°C的漏极电流退化;(ii)存在第二种不稳定性机制,这种机制最初在低温下占主导地位长达数小时或数天,因此仅在室温下进行的试验可能无法准确预测寿命。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two-stage model for lifetime prediction of highly stable amorphous-silicon thin-film transistors under low-gate field
Highly stable a-Si TFTs reported recently with extremely long operating lifetimes under DC gate bias are attractive for analog drivers of the OLEDs in AMOLED displays. At room temperature, the time for the DC saturation current to drop to 50% is predicted to be 100 to 1,000 years. However, the lifetimes were extrapolated with a stretched-exponential model for defect creation in a-Si, based on only month-long room temperature tests. In this study, we present a two-stage threshold voltage shift model for lifetime prediction from temperature dependent measurements. We find that (i) a “unified stretched exponential fit” models the drain current degradation from 60°C to 140°; and (ii) there is a second instability mechanism that initially dominates up to hours or days at low temperatures, so that tests conducted only at room temperature may not predict lifetime accurately.
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