石墨烯在氮化硼上的传输

D. Ferry
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引用次数: 1

摘要

近年来,石墨烯因其独特的能带结构和在微波和逻辑器件中的潜在重要性而引起了人们的极大兴趣。最近,在石墨烯和二氧化硅衬底之间使用氮化硼层,由于将氧化物上典型的无序电荷从石墨烯材料中移走,显示出增强的迁移率。另一方面,像氧化物一样,氮化硼具有极性光学模式,可以与石墨烯中的载流子相互作用以降低其迁移率。我们使用集合蒙特卡罗技术研究了石墨烯在氮化硼层上的输运。包括石墨烯的本征声子散射、波纹层的弯曲模式和氮化硼的远极性模式。弯曲模态由Castro等人的模型描述。当电磁兼容使用简单的狄拉克带结构时,本征声子模式的耦合常数通过拟合由第一性原理计算确定的散射率来获得。我们发现,在低温下,迁移率主要由固有的石墨烯声子和弯曲模式主导。这是因为氮化硼的界面极性模式处于200兆电子伏的能量,这个能量太高,无法与石墨烯中的大多数载流子很好地相互作用。另一方面,在室温下,氮化硼的迁移率开始以远极性模式为主。然而,达到高速度的前景仍然很好,特别是在微波频率下,这是设备性能所需要的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transport in graphene on boron nitride
Graphene has become of great interest in recent years for its unique band structure and prospective importance in both microwave and logic devices. Recently, the use of a boron nitride layer between the graphene and the silicon dioxide substrate has shown enhanced mobilities due to displacing the disorder charge, typical on the oxide, further from the graphene material. On the other hand, like the oxide, boron nitride has polar optical modes which can interact with the carriers in graphene to lower their mobility. We have used an ensemble Monte Carlo technique to study the transport in graphene on a boron nitride layer. Scattering by the intrinsic phonons of graphene, as well as by the flexural modes of the rippled layer, and the remote polar mode of boron nitride has been included. The flexural modes are described by the model of Castro et al. While the EMC uses the simple Dirac band structure, coupling constants for the intrinsic phonon modes are taken by fitting to scattering rates determined from first-principles calculations. We find that, at low temperatures, the mobility is dominated primarily by the intrinsic graphene phonons and the flexural modes. This arises as the interfacial polar mode of boron nitride lies at an energy of 200 meV, which is largely too high to interact well with the majority of the carriers in graphene. On the other hand, at room temperature, the mobility begins to be dominated by the remote polar mode of the boron nitride. Nevertheless, the prospects of reaching a high velocity, needed for device performance particularly at microwave frequencies, remains very good.
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