基于AlGaN/GaN HEMT传感器局部加热的有限元热分析

Minmin Hou, Chi-Chun Pan, M. Asheghi, D. Senesky
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引用次数: 3

摘要

本文报道了基于AlGaN/GaN高电子迁移率晶体管(HEMT)结构的稳态和瞬态温度响应。在本研究中,研究了三种局部加热方案,即连续自加热、脉冲自加热和片上加热器加热,用于需要控制加热剖面的传感器应用。GaN传感器结构考虑了两种情况:1)没有移除AlGaN/GaN传感器下的硅衬底,2)移除硅衬底形成悬浮的AlGaN/GaN隔膜,传感器位于该膜片上。通过有限元热分析对三种加热方案进行了分析、评价和比较。此外,还提供了基于AlGaN/GaN HEMT传感器的局部加热架构设计的一般指南。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Finite element thermal analysis of localized heating in AlGaN/GaN HEMT based sensors
This paper reports the steady-state and transient temperature response of AlGaN/GaN high electron mobility transistor (HEMT) based structures. In this study, three localized heating schemes, namely, continuous self-heating, pulsed self-heating and heating with on-chip heaters are studied for sensor applications that require controlled heating profiles. Two scenarios were considered for the GaN sensor structure: 1) the silicon substrate under the AlGaN/GaN sensor is not removed, and 2) the silicon substrate is removed to form a suspended AlGaN/GaN diaphragm on which the sensor is located. The three heating schemes are analyzed by finite element thermal analysis, evaluated and compared. In addition, general guidelines for designing localized heating architectures for AlGaN/GaN HEMT based sensors are provided.
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