高度可靠和极其稳定的SiGe微镜

M. Gromova, L. Haspeslagh, A. Verbist, B. du Bois, R. Van Hoof, B. Eyckens, B. Sijmus, I. De Wolf, V. Simons, P. Mutter, T. Lauwagie, M. Willegems, S. Locorotondo, W. Boullart, K. Baert, A. Witvrouw
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引用次数: 12

摘要

本文介绍了一种非常可靠和稳定的由氢化微晶SiGe (much -SiGe:H)制成的微反射镜,其温度可以超过标准的CMOS电路。制作了尺寸在7.5 x 7.5和16 x 16 mum2之间的非常扁平的微镜和亚微米铰链。在20天内没有观察到铰链蠕变,在5 x 1010次循环后没有看到疲劳损伤。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Highly reliable and extremely stable SiGe micro-mirrors
This paper presents very reliable and stable micro- mirrors made of hydrogenated microcrystalline SiGe (muc-SiGe:H) at temperatures that would allow processing above standard CMOS circuitry. Very flat micro-mirrors with sizes ranging between 7.5 x 7.5 and 16 x 16 mum2 size and submicron hinges are fabricated. No hinge creep is observed over a period of 20 days and no fatigue damage is seen after 5 x 1010 cycles.
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