外延FeRh薄膜的原位同步加速器x射线衍射测量

2010 3rd International Nanoelectronics Conference (INEC) Pub Date : 2010-03-04 DOI:10.1109/INEC.2010.5424542

Sung-Uk Jang, S. Hyun, Hwan-Soo Lee, Soon-Ju Kwon, Ji-Hong Kim, K. Park, Hak-Joo Lee

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引用次数: 0

摘要

采用磁性能测量系统(MPMS)和x射线衍射仪(XRD)研究了在MgO(001)衬底上外延生长的FeRh薄膜的磁性能和结构。FeRh薄膜的转变温度在380K左右。M-T曲线和d-间距变化之间的对应关系非常密切。从原位分析中可以观察到晶格常数的突变。此外，有可能存在一个新阶段。

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In-situ synchrotron X-ray diffraction measurement of epitaxial FeRh thin films

The magnetic properties and structure of FeRh thin film epitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of FeRh thin films was around 380K. Both M-T curve and d-spacing changes correspond to each other very closely. Abrupt changes in the lattice constants can be observed from the in-situ analysis. Also, there is the likelihood of existence of a new phase.

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2010 3rd International Nanoelectronics Conference (INEC)

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