Chih-Hsun Hsu, Wen-Yang Li, Chi‐Jen Chen, Y. Jiang, Jui-Feng Tai, Chang-Fu Lin, C. Chung
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The 1st carrier was then de-bonded. High I/O Si dies were attached onto the opposite side of the carrier followed by molding. The difference between C4 first and C4 last is the Si dies that were attached and molded with the carrier first then fabricated the C4 bumps. C4 first process has the challenge is micro-pads pattern shift between Si dies. By increasing the RDL density, one could reduce the irregular of micro-pads pattern shift. Additionally, by reducing the thermal budget and using higher Tg of the temporary bond glue, the pattern shift was improved to less than 5 mm. Additionally, the wafer warpage of C4 first was found consistently warped at the same side, thus the process was easier to control as compared to C4 last. The assembled FOMCM packages were then stressed for reliability tests. It passed 1000 hours of high temperature storage life test; MSL4 preconditioning with 1000 thermal cycles under B-conditions (-55~125 °C) and 192 hours unbiased high accelerated stress. 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Additionally, by reducing the thermal budget and using higher Tg of the temporary bond glue, the pattern shift was improved to less than 5 mm. Additionally, the wafer warpage of C4 first was found consistently warped at the same side, thus the process was easier to control as compared to C4 last. The assembled FOMCM packages were then stressed for reliability tests. It passed 1000 hours of high temperature storage life test; MSL4 preconditioning with 1000 thermal cycles under B-conditions (-55~125 °C) and 192 hours unbiased high accelerated stress. 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引用次数: 5
摘要
扇出式晶圆级封装(FOWLP)的芯片末装工艺复杂且成本较高。但是,该技术适合于非常高密度的互连封装。本文介绍了采用C4碰撞优先的扇出多芯片模块(FO-MCM)封装芯片末装技术。目标是减少循环时间。一个28 x 30 mm的芯片模块是用2个菊花链硅模制成的,硅模粘接在2/2µm的线/空间再分配层(rdl)上。然后将该模块组装在尺寸为70 x 70 mm的高密度基板上。这个FOMCM包是使用C4第一个过程构造的。在RDL制造后,在航母的同一侧建造C4凸起。这些组件被保护并使用临时粘合胶粘合在载体上。然后,第一艘航母被解除了束缚。高I/O Si模具附着在载体的对面,然后成型。C4第一和C4最后之间的区别是Si模具附着和模塑与载体,然后制造C4颠簸。C4第一工艺所面临的挑战是微晶片在硅模之间的模式移位。通过增加RDL密度,可以减少微片模式移动的不规则性。此外,通过减少热收支和使用更高Tg的临时粘合胶,图案位移改善到小于5毫米。此外,发现C4的晶圆翘曲始终在同一侧弯曲,因此与C4相比,该过程更容易控制。然后对组装好的FOMCM包进行了可靠性测试。通过1000小时高温贮存寿命试验;MSL4预处理在b条件下(-55~125°C)进行1000个热循环和192小时无偏高加速应力。结果的细节将被展示和讨论。
Construction of FO-MCM with C4 Bumps Built First Using Chip Last Assembly Technology
Chip last assembly technology is complex and higher cost for fan-out wafer level package (FOWLP). But, this technology is fit well for very high density interconnection packages. This article presents chip last assembly technology using C4 bump-first for fan out multi-chip module (FO-MCM) package. The objective is to reduce cycle-time. A chip module with 28 x 30 mm was fabricated using 2 daisy-chain Si dies that bonded onto 2/2 µm line/space redistribution layers (RDLs). This module was then assembled on high density substrate with size of 70 x 70 mm. This FOMCM package is constructed using C4 first process. C4 bumps were built on same side of the carrier after RDL was fabricated. The assemblies were protected and bonded on the carrier using temporary bond glue. The 1st carrier was then de-bonded. High I/O Si dies were attached onto the opposite side of the carrier followed by molding. The difference between C4 first and C4 last is the Si dies that were attached and molded with the carrier first then fabricated the C4 bumps. C4 first process has the challenge is micro-pads pattern shift between Si dies. By increasing the RDL density, one could reduce the irregular of micro-pads pattern shift. Additionally, by reducing the thermal budget and using higher Tg of the temporary bond glue, the pattern shift was improved to less than 5 mm. Additionally, the wafer warpage of C4 first was found consistently warped at the same side, thus the process was easier to control as compared to C4 last. The assembled FOMCM packages were then stressed for reliability tests. It passed 1000 hours of high temperature storage life test; MSL4 preconditioning with 1000 thermal cycles under B-conditions (-55~125 °C) and 192 hours unbiased high accelerated stress. Details of the results will be presented and discussed.