结合衬底捕获、表面捕获和热效应的改进4H-SiC mesfet的I-V模型

M. Rao, N. Murty
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引用次数: 0

摘要

提出了一种改进的4H-SiC金属半导体场效应晶体管(mesfet)直流特性分析模型。该模型考虑了基片捕获、表面捕获和热效应三种主要效应来描述器件的直流行为。I-V特性的分析模型包括场依赖电子迁移率的caugey - thomas模型、多个深能级陷阱捕获衬底电子(这是4H-SiC的特性)和栅极下电荷分布的二维分析。在I-V特性上观察到漏极电流的崩溃。这一独特的模型是一个完整的模型,它考虑了所有关键的材料缺陷和热效应。因此,模型行为非常接近于实时MESFET。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An improved I-V model of 4H-SiC MESFETs incorporating substrate trapping, surface trapping and thermal effects
An improved analytical model for the DC characteristics of 4H-SiC MEtal Semiconductor Field Effect Transistors (MESFETs) is proposed. The model takes into account three major effects namely substrate trapping, surface trapping and thermal effects to describe the DC behavior of the device. The analytical model of I-V characteristics incorporate Caughey-Thomas model of field dependence electron mobility, substrate trapping of electrons by multiple deep level traps (which is the characteristic of 4H-SiC) and two-dimensional analysis of charge distribution under the gate. The collapse of drain current is observed on the I-V characteristics. This unique model proposed is a complete model which takes into consideration all the critical material defects and thermal effects with trapping. Hence the model behavior is very close to real time MESFET.
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