Toshiya Hamasaki, K. Yagyu, H. Mitani, T. Nishida, H. Tochihara, Takayuki Suzuki
{"title":"在中等温度下对SiC(0001)表面进行氢蚀刻","authors":"Toshiya Hamasaki, K. Yagyu, H. Mitani, T. Nishida, H. Tochihara, Takayuki Suzuki","doi":"10.1116/6.0001147","DOIUrl":null,"url":null,"abstract":"Hydrogen etching of a 4H-SiC(0001) surface at a moderate temperature of 1200 °C with molecular hydrogen gas was investigated to obtain enough flat and clean surface for large-scale high-quality epitaxial graphene synthesis. We found after a prolonged hydrogen etching that micro scratches, large depressions, and contaminations produced on the wafer in the manufacturing process disappeared and that a periodic array of atomic steps appeared, maintaining initial flat surface morphology. One hour of etching with a flow of 1.0 l/min was the optimum condition to obtain a flat and clean SiC surface in the present study. Using such surfaces, we were able to synthesize the so-called zero layer graphene by thermal annealing in ultrahigh vacuum.","PeriodicalId":17652,"journal":{"name":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Hydrogen etching of the SiC(0001) surface at moderate temperature\",\"authors\":\"Toshiya Hamasaki, K. Yagyu, H. Mitani, T. Nishida, H. Tochihara, Takayuki Suzuki\",\"doi\":\"10.1116/6.0001147\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Hydrogen etching of a 4H-SiC(0001) surface at a moderate temperature of 1200 °C with molecular hydrogen gas was investigated to obtain enough flat and clean surface for large-scale high-quality epitaxial graphene synthesis. We found after a prolonged hydrogen etching that micro scratches, large depressions, and contaminations produced on the wafer in the manufacturing process disappeared and that a periodic array of atomic steps appeared, maintaining initial flat surface morphology. One hour of etching with a flow of 1.0 l/min was the optimum condition to obtain a flat and clean SiC surface in the present study. Using such surfaces, we were able to synthesize the so-called zero layer graphene by thermal annealing in ultrahigh vacuum.\",\"PeriodicalId\":17652,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0001147\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0001147","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hydrogen etching of the SiC(0001) surface at moderate temperature
Hydrogen etching of a 4H-SiC(0001) surface at a moderate temperature of 1200 °C with molecular hydrogen gas was investigated to obtain enough flat and clean surface for large-scale high-quality epitaxial graphene synthesis. We found after a prolonged hydrogen etching that micro scratches, large depressions, and contaminations produced on the wafer in the manufacturing process disappeared and that a periodic array of atomic steps appeared, maintaining initial flat surface morphology. One hour of etching with a flow of 1.0 l/min was the optimum condition to obtain a flat and clean SiC surface in the present study. Using such surfaces, we were able to synthesize the so-called zero layer graphene by thermal annealing in ultrahigh vacuum.