表面粗糙度对纳米线TFET性能影响的量子力学模拟

Yunhe Guan, Zunchao Li, H. Carrillo-Nuñez, V. Georgiev, A. Asenov
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引用次数: 3

摘要

本文研究了表面粗糙度(SR)对p型InAs纳米线隧道场效应管(TFET)变异性的影响。使用格拉斯哥大学量子输运模拟工具(称为NESS)中实现的非平衡格林函数(NEGF)模块,我们模拟了具有独特SR曲线的200个tfet的统计集合。每个器件中的SR由SR均方根幅值(RMS)和相关长度的特征值定义。结果表明,均方根值越大,变异性越强。我们发现,与均匀的InAs相比,在InAs- si异质结构tfet中,sr诱导的可变性降低了。研究了金属晶粒粒度和随机离散掺杂剂对纳米钛酸钠tfet的影响。我们的发现表明,SR是统计变异性的最弱来源。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantum Mechanical Simulations of the Impact of Surface Roughness on Nanowire TFET performance
In this work, the impact of the surface roughness (SR) on the variability in p-type InAs nanowire Tunnel FET (TFET) has been investigated. Using the Non-Equilibrium Green’s Function (NEGF) module implemented in the University of Glasgow quantum transport simulation tool, called NESS, we have simulated a statistical ensemble of 200 TFETs with unique SR profiles. The SR in each device is defined by the characteristic values of the SR root mean square amplitude (RMS) and correlation length. Our results show that the larger the RMS, the stronger the variability. We find that the SR-induced variability is reduced in InAs-Si heterostructure TFETs when comparing with their homogenous InAs counterpart. The impacts of both metal grain granularity and random discrete dopants on InAs TFETs are also studied. Our finding suggests that SR is the weakest source of statistical variability.
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