Ni/n型4H-SiC肖特基触点金属化后退火的影响

R. Pascu, F. Craciunoiu, M. Kusko, F. Draghici, A. Dinescu, M. Danila
{"title":"Ni/n型4H-SiC肖特基触点金属化后退火的影响","authors":"R. Pascu, F. Craciunoiu, M. Kusko, F. Draghici, A. Dinescu, M. Danila","doi":"10.1109/SMICND.2012.6400732","DOIUrl":null,"url":null,"abstract":"The Schottky diode for temperature sensor based on 4H-SiC is presented. This paper is focused on the improvement of the Schottky contact and interface stabilization using an annealing in Ar atmosphere. The diodes have been measured in range of temperature 50-150°C.","PeriodicalId":9628,"journal":{"name":"CAS 2012 (International Semiconductor Conference)","volume":"86 1","pages":"457-460"},"PeriodicalIF":0.0000,"publicationDate":"2012-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"The effect of the post-metallization annealing of Ni/n-type 4H-SiC SCHOTTKY contact\",\"authors\":\"R. Pascu, F. Craciunoiu, M. Kusko, F. Draghici, A. Dinescu, M. Danila\",\"doi\":\"10.1109/SMICND.2012.6400732\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Schottky diode for temperature sensor based on 4H-SiC is presented. This paper is focused on the improvement of the Schottky contact and interface stabilization using an annealing in Ar atmosphere. The diodes have been measured in range of temperature 50-150°C.\",\"PeriodicalId\":9628,\"journal\":{\"name\":\"CAS 2012 (International Semiconductor Conference)\",\"volume\":\"86 1\",\"pages\":\"457-460\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CAS 2012 (International Semiconductor Conference)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2012.6400732\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CAS 2012 (International Semiconductor Conference)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2012.6400732","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

提出了一种基于4H-SiC的温度传感器肖特基二极管。本文重点研究了在氩气气氛中利用退火技术改善肖特基接触和界面稳定性的方法。二极管的测量温度范围为50-150°C。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of the post-metallization annealing of Ni/n-type 4H-SiC SCHOTTKY contact
The Schottky diode for temperature sensor based on 4H-SiC is presented. This paper is focused on the improvement of the Schottky contact and interface stabilization using an annealing in Ar atmosphere. The diodes have been measured in range of temperature 50-150°C.
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