高速SiGe:C双极技术

J. Bock, H. Schafer, H. Knapp, D. Zoschg, K. Aufinger, M. Wurzer, S. Boguth, R. Stengl, R. Schreiter, T. Meister
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引用次数: 28

摘要

开发了一种集成双多晶硅自对准晶体管的窄基SiGe:C双极技术。当集电极发射极击穿电压为2.3 V时,传输频率为106 GHz,最大振荡频率为145 GHz,栅极延迟为6.5 ps时,晶体管的性能达到平衡。实现了高速数字、模拟和低功耗电路的最先进结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-speed SiGe:C bipolar technology
A SiGe:C bipolar technology with a narrow base integrated into a double-polysilicon self-aligned transistor has been developed. A transit frequency of 106 GHz at a collector emitter breakdown voltage of 2.3 V, a maximum oscillation frequency of 145 GHz, and 6.5 ps gate delay demonstrate balanced transistor performance. State-of-the-art results for high-speed digital, analog, and low-power circuits are achieved.
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