D. Burnett, J. Higman, A. Hoefler, C.-N.B. Li, P. Kuhn
{"title":"掺杂物引起的NVM电路自然阈值电压变化及其对可靠性的影响","authors":"D. Burnett, J. Higman, A. Hoefler, C.-N.B. Li, P. Kuhn","doi":"10.1109/IEDM.2002.1175896","DOIUrl":null,"url":null,"abstract":"The statistical distribution of the natural threshold voltage (V/sub T0/) of 512k-bit NVM circuit arrays has been studied for two different technologies. The major source of the V/sub T0/ variation is dopant fluctuations of the NVM well. An analytical model for the dopant fluctuations provides excellent agreement with the measured circuit V/sub T0/ variation and NVM cell mismatch for both technologies. The reliability implications of the V/sub T0/ variation are considered using charge leakage models for data retention.","PeriodicalId":74909,"journal":{"name":"Technical digest. International Electron Devices Meeting","volume":"43 1","pages":"529-532"},"PeriodicalIF":0.0000,"publicationDate":"2002-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":"{\"title\":\"Variation in natural threshold voltage of NVM circuits due to dopant fluctuations and its impact on reliability\",\"authors\":\"D. Burnett, J. Higman, A. Hoefler, C.-N.B. Li, P. Kuhn\",\"doi\":\"10.1109/IEDM.2002.1175896\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The statistical distribution of the natural threshold voltage (V/sub T0/) of 512k-bit NVM circuit arrays has been studied for two different technologies. The major source of the V/sub T0/ variation is dopant fluctuations of the NVM well. An analytical model for the dopant fluctuations provides excellent agreement with the measured circuit V/sub T0/ variation and NVM cell mismatch for both technologies. The reliability implications of the V/sub T0/ variation are considered using charge leakage models for data retention.\",\"PeriodicalId\":74909,\"journal\":{\"name\":\"Technical digest. International Electron Devices Meeting\",\"volume\":\"43 1\",\"pages\":\"529-532\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-12-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"14\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical digest. International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2002.1175896\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical digest. International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2002.1175896","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Variation in natural threshold voltage of NVM circuits due to dopant fluctuations and its impact on reliability
The statistical distribution of the natural threshold voltage (V/sub T0/) of 512k-bit NVM circuit arrays has been studied for two different technologies. The major source of the V/sub T0/ variation is dopant fluctuations of the NVM well. An analytical model for the dopant fluctuations provides excellent agreement with the measured circuit V/sub T0/ variation and NVM cell mismatch for both technologies. The reliability implications of the V/sub T0/ variation are considered using charge leakage models for data retention.