Low-Cost Shadow Mask Fabrication for Nanoelectronics

We present two approaches for fabricating shadow masks for the evaporation of electrodes onto nanomaterials. In the first one, we combine the use of a commercial fiber laser engraving system with readily available aluminum foil. This method is suitable for fabricating shadow masks with line widths of 50 µm and minimum feature separation of 20 µm, and using it to create masks with complex patterns is very straightforward. In the second approach, we use a commercially available vinyl cutting machine to pattern a vinyl stencil mask, and we use a glass fiber to define the separation between the electrodes. With this approach, we achieve well-defined electrodes separated by 15 µm, but this technique is less versatile in creating complex masks as compared with the laser-based one. We demonstrate the potential of these techniques by fabricating field-effect transistor devices based on MoS2. Our approach is a cost-effective and easily accessible method for fabricating shadow masks with high resolution and accuracy, making it accessible to a wider range of laboratories.