{"title":"利用OptiScan，隔行光束扫描，为Axcelis Purion XE植入器提高生产效率","authors":"S. Satoh, R. Coolbaugh, C. Geary, J. Deluca","doi":"10.1109/IIT.2014.6940026","DOIUrl":null,"url":null,"abstract":"The Axcelis Purion XE is a RF linac based single wafer, hybrid scan, high energy ion implanter. The Purion XE provides customers the highest mechanical throughput with best in class beam currents. It is also equipped with features to fully utilize its high beam current capability such as IntelliScan. IntelliScan maintains precise dose and uniformity even under conditions of extreme photoresist outgassing due to high beam power. To further enhance the Purion XE's industry leading productivity, OptiScan, a system for enhancing the beam utilization, has been developed.","PeriodicalId":6548,"journal":{"name":"2014 20th International Conference on Ion Implantation Technology (IIT)","volume":"1 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Productivity improvements utilizing OptiScan, interlaced beam scanning, for Axcelis Purion XE implanter\",\"authors\":\"S. Satoh, R. Coolbaugh, C. Geary, J. Deluca\",\"doi\":\"10.1109/IIT.2014.6940026\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Axcelis Purion XE is a RF linac based single wafer, hybrid scan, high energy ion implanter. The Purion XE provides customers the highest mechanical throughput with best in class beam currents. It is also equipped with features to fully utilize its high beam current capability such as IntelliScan. IntelliScan maintains precise dose and uniformity even under conditions of extreme photoresist outgassing due to high beam power. To further enhance the Purion XE's industry leading productivity, OptiScan, a system for enhancing the beam utilization, has been developed.\",\"PeriodicalId\":6548,\"journal\":{\"name\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"volume\":\"1 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 20th International Conference on Ion Implantation Technology (IIT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2014.6940026\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 20th International Conference on Ion Implantation Technology (IIT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2014.6940026","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The Axcelis Purion XE is a RF linac based single wafer, hybrid scan, high energy ion implanter. The Purion XE provides customers the highest mechanical throughput with best in class beam currents. It is also equipped with features to fully utilize its high beam current capability such as IntelliScan. IntelliScan maintains precise dose and uniformity even under conditions of extreme photoresist outgassing due to high beam power. To further enhance the Purion XE's industry leading productivity, OptiScan, a system for enhancing the beam utilization, has been developed.
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