Zn-C镶嵌靶冲蚀的二维粒子池/蒙特卡罗碰撞模拟

A. Addie, R. Ismail, M. Mohammed
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引用次数: 0

摘要

本文采用粒子池/蒙特卡罗碰撞(PIC/MCC)有限元方法对商用磁控溅射源进行了仿真分析,以优化Zn-C镶嵌靶的结构。在二维柱坐标系下求解磁场分布,并在直流磁控溅射系统中跟踪氩、锌、碳等粒子的电子、原子和带电离子。考虑离子和电子密度分布,研究了腐蚀靶材的溅射产率曲线和粒子通量。锌和碳的最大溅射通量分别为1.97510 21 m -2 .s -1和3.710 18 m -2 .s -1。根据目标表面的最大功率密度分布预测目标的侵蚀位置。通过与溅射数小时后侵蚀目标的测量结果进行比较,验证了模拟的准确性。而对于锌- c镶嵌靶,其轨迹与数值模拟过程预测的结果一致。本研究结果可为设计镶嵌靶并优化其在纳米杂化薄膜结构中的应用提供指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
2D Particle-in-Cell/Monte Carlo Collision Simulation of Zn-C Mosaic Target Erosion
In this work, a simulation analysis of a commercial magnetron sputtering source was performed using the finite element method Particle-in-Cell/Monte Carlo Collision (PIC/MCC) to optimize the configuration of the Zn-C mosaic target. The magnetic field distribution was solved in a two-dimensional cylindrical coordinate system, and particles such as electrons, atoms, and charged ions of argon, zinc, and carbon were tracked in a DC magnetron sputtering system. The sputtering yield profile and particle flux for the eroded target were studied considering the ion and electron density distributions. The maximum sputtering flux of zinc and carbon was 1.975  10 21 m -2 .s -1 and 3.7  10 18 m -2 .s -1 respectively. The erosion position of a target was predicted based on the maximum power density distribution at the surface of the target. The accuracy of the simulation was checked by comparing it with the measurement of the target eroded after several hours of sputtering. However, as for the Zn-C mosaic target, the racetrack was identical to the analysis predicted by the numerical simulation process. The results of this work can be used as a guide for designing mosaic targets and optimizing their use for fabricating nanohybrid thin film structures.
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