分子氢与氧化锆之间的低温相互作用:对表面组成、电荷和润湿性的影响

S. Ardizzone , M.G. Cattania , M. Sarti
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引用次数: 9

摘要

ZrO2粉末在低温(25-200℃)和不同时间(15 min-22 h)下与氢分子接触,x射线光电子能谱测定表明,无论采用何种条件,氢处理都不会诱导Zr3+表面缺陷的形成。相反,发现Zr4+谱在T大于或等于80°C时进行了修改。双电层的反应性随处理温度的升高而变化。观察到在T小于80°C处处理的样品的零电荷点的值向碱性方向移动,治疗时间越长,移动越多。对沉积在玻璃片上的ZrO2层进行的静态接触角测量表明,H2处理后水的润湿性降低。讨论了不同观测效应之间可能存在的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low temperature interactions between molecular hydrogen and zirconia: Effects on the composition, charge and wettability of the surface

ZrO2 powders have been subjected to contact with molecular hydrogen at low temperatures T (25–200°C) and for variable duration (15 min–22 h).

X-ray photoelectron spectroscopy determinations showed that the hydrogen treatment, whatever the adopted condition, did not induce the formation of Zr3+ surface defects. Zr4+ spectra were, instead, found to be modified for treatments performed at T ⩾ 80°C. The same trend with the temperature of the treatment was observed for the reactivity of the electrical double layer. The values of the point of zero charge of samples treated at T ⩾ 80°C were observed to shift in the alkaline direction, the more so the longer the length of treatment. Static contact-angle measurements performed on ZrO2 layers deposited on glass platelets indicated that the wettability for water decreased upon H2 treatment. Possible relations between the different observed effects are discussed.

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