结合光谱技术研究n型4H-SiC中的多数和少数载流子陷阱

I. Capan
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引用次数: 4

摘要

本文综述了n型4H-SiC材料中最常见的多数和少数电荷载流子陷阱。我们重点讨论了结谱技术的不同应用所得到的结果。给出了最常见的结光谱技术背后的基本原理。这些技术,即深能级瞬态光谱(DLTS)、拉普拉斯瞬态光谱(L-DLTS)和少数载流子瞬态光谱(MCTS),在识别和更好地理解n型4H-SiC材料中的载流子陷阱方面取得了最新进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Majority and Minority Charge Carrier Traps in n-type 4H-SiC Studied by Junction Spectroscopy Techniques
In this review, we provide an overview of the most common majority and minority charge carrier traps in n-type 4H-SiC material. We focus on the results obtained by different applications of junction spectroscopy techniques. The basic principles behind the most common junction spectroscopy techniques are given. These techniques, namely, deep level transient spectroscopy (DLTS), Laplace DLTS (L-DLTS) and minority carrier transient spectroscopy (MCTS) have led to recent progress in identifying and better understanding of the charge carrier traps in n-type 4H-SiC material.
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