用于嵌入式存储器的22nm STT -MRAM的可靠性验证

Chia-Yu Wang, Meng-Chun Shih, Chih-Hui Weng, Chia-Hsiang Chen, Chih-Yang Chang, Wayne Wang, T. Chiang, Arthur Hung, H. Chuang, W. Gallagher
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引用次数: 2

摘要

在本文中,我们充分证明了回流合格嵌入式S TT - MRAM集成在22nm技术的可靠性。我们表明,STT-MRAM能够在温度(-40、25和125°C)下以极低的故障比特率(-40°C时平均0.04 ppm)进行1E5个循环,并且可以使用增强的工艺通过1M循环耐久性。在260°C的焊接回流三个周期后,并行(P)和反并行(AP)存储状态的误码率(ber)低于1ppm。由于翻转态的高能量垒,芯片可以满足非常高的保留寿命规格(>200°C, 10年,BER 1 ppm),并且有很大的余量。两种状态之间的保留性能平衡可以在优化过程中进行调整。此外,我们研究了倾斜角度下磁场的影响,并报告了在125°C下,与模具表面平行倾斜60度的磁场可在10年内达到600 Oe的备用磁场抗扰度。经证明,磁屏蔽可以将数据暴露在高达3.5k Oe的垂直磁场中,温度为25°C,持续100小时。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability Demonstration of Reflow Qualified 22nm STT -MRAM for Embedded Memory Applications
In this paper, we thoroughly demonstrate the reliability of reflow qualified embedded S TT - MRAM integrated on 22nm technology. We show that STT-MRAM is capable of 1E5 endurance cycles across temperature (-40, 25 and 125°C) with extremely low fail bit rates (mean 0.04 ppm for −40°C) and can pass 1M cycle endurance using an enhanced process. Bit error rates (BERs) post three cycles of solder reflow at 260°C are below 1 ppm for both parallel (P) and anti-parallel (AP) storage states. Due to the associated high energy barrier for flipping states, chips can meet a very high retention lifetime spec (>200°C at 10yrs, BER 1 ppm) with a large margin. The balance of retention performance between the two states can be adjusted in an optimized process. In addition, we investigate the impact of magnetic field applied at tilted angles and report standby magnetic field immunity can reach 600 Oe at 125°C for 10 years for fields tilted 60 degrees from parallel to the die surface. Magnetic shields are demonstrated to sustain data exposed to perpendicular fields up to 3.5k Oe at 25°C for 100 hours.
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